https://www.selleckchem.com/
In the real data experiment, the mean reprojection error of the TPCM method is less than one pixel, which is smaller than current state-of-the-art methods, and we believe meets the demand for high-precision calibration.A refined model of an extreme ultraviolet (EUV) mask stack consisting of the Mo/Si multilayer coated by a Ru protective layer and a TaBN/TaBO absorber layer was developed to facilitate accurate simulations of EUV mask performance for high-NA EUV photo-lithography (EUVL) imaging. The model is derived by combined analysis of the measured EUV an
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