https://www.selleckchem.com/pr....oducts/acetosyringon
The presence of NO3- promoted RhB degradation, while H2PO4- and C2O42- showed an inhibitory effect on both UV/H2O2 and UV/PS processes. Radical scavenging tests revealed the dominant role of SO4•- radicals in the UV/PS system. Furthermore, the evolution of low molecular weight organic acids and NH4+ during the degradation of RhB in these two processes were compared. Both UV/H2O2 and UV/PS systems led to similar formation trends of NH4+ and some ring-opening products (e.g., formic acid, acetic acid, and oxalic acid), suggesting so
Like
Comment
Share
