https://www.selleckchem.com/products/sel120.html
Transition metal nitrides, like titanium nitride (TiN), are promising alternative plasmonic materials. Here we demonstrate a low temperature plasma-enhanced atomic layer deposition (PE-ALD) of non-stoichiometric TiN0.71 on lattice-matched and -mismatched substrates. The TiN was found to be optically metallic for both thick (42 nm) and thin (11 nm) films on MgO and Si substrates, with visible light plasmon resonances in the range of 550-650 nm. We also demonstrate that a hydrogen plasma post-deposition treatment improves the metallic qual
Like
Comment
Share
