https://www.selleckchem.com/pr....oducts/filanesib.htm
Ge single-junction solar cell structures are grown on micro-patterned Ge substrates using lowpressure metalorganic chemical vapor deposition. 300 nm high micro-rod arrays are formed on the p-Ge substrates using photolithography and dry etching techniques. The micro-rod arrays are designed with rod diameter varying from 5 to 15 μm and arranged in a hexagonal geometry with rod spacing varying from 2 to 12 μm. Ge p-n junction structures are fabricated by phosphorus atomic diffusion process on the micro-patterned Ge substrates. 100 nm thi
Like
Comment
Share
