https://www.selleckchem.com/products/pd123319.html
Nickel oxide (NiO) films cover numerous electronic applications, including transparent conducting oxides and hole transport layer, because of its high transparency and wide band gap. A sparking discharge is a new and unique method for the deposition of NiO films due to non-complex operation and non-requirement of a vacuum atmosphere. Unfortunately, NiO films by the sparking method display a porous surface with inferior crystallinity. By assisting a uniform magnetic field in the sparking method, the porous and the crystallinity of NiO a
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