https://www.selleckchem.com/pr....oducts/ca-074-methyl
At an O2 H2 O gas flow rate ratio of 13, a cathodal charge-storage capacity per unit film thickness of 228.7 mC cm-2 μm-1 (median, Q1 = 134.5, Q3 = 236.6, n = 15) and a charge-injection capacity (0.6 V anodal interpulse bias) of 7.4 mC cm-2 (median, Q1 = 6.9, Q3 = 8.3, n = 15) were obtained in phosphate buffered saline. The charge-injection capacity of ruthenium oxide sputtered with water vapor in the reactive plasma is comparable with sputtered iridium oxide (SIROF) and higher than reported values for porous TiN, a commonly
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