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Ag and Ta co-doped ACP coating movies were fabricated on Ti substrates by radiofrequency (RF) magnetron sputtering. The sputtering objectives were hot-pressed sintered compacts with the same Ag focus of 10 mol% and varying Ta concentration (0, 0.8, and 8.0 molpercent), even though the RF power ended up being changed from 8 to 50 W. With increasing RF power, Ag focus within the finish films reduced. The fabricated ACP coating films were heavy and smooth, due to their constituent elements (P, Ca, Ag, and Ta) distributed homogene
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