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Using a multilayer deposition approach, we first electrophoretically deposit (EPD) silicon dioxide (SiO2) as an intermediate layer between the metallic substrate and SOCAL. The necessity of EPD SiO2 is to smooth ( less then 10 nm roughness) as well as to enable the proper surface chemistry for SOCAL bonding. To characterize antiscaling performance, we utilized calcium sulfate (CaSO4) scale tests, showing a 20× reduction in scale deposition rate than untreated metallic substrates. Descaling tests revealed that SOCAL dramatically decrease
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