https://www.selleckchem.com/pr....oducts/pf-06952229.h
The reactions of boric acid and 4-fluorophenylboronic acid with H- and Cl-terminated Si(10 surfaces in solution were investigated. X-ray photoelectron spectroscopy (XPS) studies reveal that both molecules react preferentially with Cl-Si(10 and not with H-Si(10 at identical conditions. On Cl-Si(10, the reactions introduce boron onto the surface, forming a Si-O-B structure. The quantification of boron surface coverage demonstrates that the 4-fluorophenylboronic acid leads to ∼2.8 times higher boron coverage compared to that of
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