https://www.selleckchem.com/pr....oducts/PF-2341066.ht
The data were subjected to the 2-way ANOVA test and the Tukey honestly significant difference test (α=.05). RESULTS The EH-2 and MT-2 showed the lowest posterior (P.05). Regardless of the loading area, the MI-1 and MI-2 groups showed the lowest von Mises stress values. However, for implant housing, the MI-1 group, under incisor loading, presented greater stress, followed by MT-1, EH-1, EH-2, MI-2, and MT-2. The attachment was the most overloaded structure, with high values under incisor loading, especially for the groups with 2 impla
Like
Comment
Share
