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Decorating a thin catalyst level regarding the n-type silicon surface can provide an immediate and efficient path toward PEC liquid oxidation. But, almost all of catalyst immobilization methods for reported n-type silicon photoanodes being predicated on energetically demanding, time-consuming, and high-cost processes. Herein, a high-performance NiFeP alloy (NiFeP)-decorated n-type micro-pyramid silicon variety (n-Si) photoanode (NiFeP/n-Si) was served by an easy and affordable electro
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