https://www.selleckchem.com/products/brd3308.html
Micro/nanopatterning on a 2D surface is apt for cutting-edge miniaturization technology, which directly or indirectly requires high-end expensive lithographic tools. The evaporative deposition at the receding contact-line of a polymer solution, termed as Dynamic Contact Line Lithography (DCLL), can be a potential inexpensive technique for template-less meso-patterning if the deposition patterns from DCLL can be predicted a priori. A deposition map (morphological phase diagram) from the myriads of patterns is constructed in terms of cont
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