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In this manuscript, we demonstrate the potential of replacing the standard bottom anti-reflective coating (BARC) by a PolyMethylGlutarImide (PMGI) layer for wafer-scale nanofabrication by means of deep-UV Displacement Talbot Lithography (DTL). PMGI is functioning as a developable non-UV sensitive bottom anti-reflective coating (DBARC). After introducing the fabrication process using a standard BARC-based coating and the novel PMGI-based one, the DTL nanopatterning capabilities for both coatings are compared by means of the fabrication
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