https://www.selleckchem.com/products/tpx-0005.html
345). When compared to the one-implant configuration, adding a second implant further statistically decreased VD (- 10% ± 7%, p = 0.046) and AD (- 19% ± 15, p = 0.046). Adding a third implant did not lead to additional stabilization for VD nor AD (p 0.5). Compared to the non-instrumented initial state, the two-implant configuration reduces both vertical and angular displacements the most, while minimizing the number of implants. Compared to the non-instrumented initial state, the two-implant configuration reduces both vertical and
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